Kinda of amazing how consumer and enterprise chips are starting to rival the performance capability required to stimulant the human brain.

The recently Nvidia H100 is capable of one thousand trillion BFLOAT16 Tensor Core, and two thousand trillion INT8 Tensor Core operations a second. Upcoming generations of consumer and enterprise Nvidia chip over the forthcoming decade should transfer this speed into mainstream market, and further improve it.

The human brain has about sixty to hundred billion neurons, and two hundred to four hundred trillion synapses. Only between 8-16% of the human brain is active at one time, with a firing rate of between 10-40 hz a second. Furthermore, large parts of the human brain are involved in tasks unrelated to higher cognitive processors, for instance the cerebellum contains ~80% of the brain’s neurons in the manner of tightly packed granule cells, but has limited functionality when it comes to higher cognitive process.

While that’s accurate, my primary interest revolves around whether it has any inherent properties that might enable it to enhance the final resolution beyond what the Lithography source can achieve.

Yer, it was a good video, but one notion that I still don’t truly understand is does Inverse Lithography Technology (ILT) improve the final printed resolution on the photoresist, or is it simply used to reduce dimensional errors, and fostering uniformity associated with using higher numerical aperture exposures.

For instance, could it allow 8nm NA-EUV to reach lower critical dimensions such as 6nm.

He isn’t in the traditional sense. Anyone that completes a master than a doctorate can be known as a doctor. It really is the ultimate ego boost.

Actually, it’s more complex than that. Since the United States government, and domestic companies was essential in the development of technology related to the laser-produced plasma (LPP) light source for EUV.

The development of extreme-ultraviolet lithography (EUV) heavily involved complex, collaborative effort funded by United States government, Notably, the United States Department of Energy (DOE) national laboratories, including Livermore, Berkeley, and Sandia, have played a significant role in supporting EUV technology. These efforts spanned several decades, driven by public-private partnerships under Cooperative Research and Development Agreements (CRADA) that manifested as a consortium of private companies and the Labs such as the ultraviolet Limited Liability Company (EUV LLC), and United States Advanced Lithography (USAL), Additionally, it also received substantial resources from prior laser programs such as the infamous Strategic Defence Initiative (“Star Wars”).

https://www.semiconductoronline.com/doc/euv-llc-enters-development-agreement-with-new-0001

ASML played a direct and integral role in these various initiatives related to extreme-ultraviolet lithography (EUV). Additionally, the company made numerous acquisitions, including the purchase of two prominent United States-based companies: Silicon Valley Group (SVG) and Cymer in 2013. These acquisitions were particularly significant as they incorporated cutting-edge technology developed through these collaborative programs in the EUV field.

https://www.laserfocusworld.com/detectors-imaging/article/16565459/asml-to-buy-extremeuv-lightsource-maker-cymer

https://www.eetimes.com/darpa-ends-litho-aid-at-critical-juncture-for-maskless/

ASML could theoretically sell to China, they would however be blocked from using the laser-produced-plasma (LPP) Extreme ultraviolet light source from ASML USA based subsidiary that are associated with Cymer. They would be unable to sell to the United States market.