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tl;dw. 14 minutes on background, 30 seconds on TA DA! Now we have nvidia culitho.
idk I just have no intention of watching a video that doesn’t tell me what it is in the title
It’s almost like the video title is nowhere near enough to describe such complex advancements
You seriously can’t think of a better title?
Great video as always from Asianometry.
I am truly surprised that the superior results from Inverse Lithography Technology where available for more than 10 years, but not use in practice because the two week computation cited was too much.
Yer, it was a good video, but one notion that I still don’t truly understand is does Inverse Lithography Technology (ILT) improve the final printed resolution on the photoresist, or is it simply used to reduce dimensional errors, and fostering uniformity associated with using higher numerical aperture exposures.
For instance, could it allow 8nm NA-EUV to reach lower critical dimensions such as 6nm.
I mean one could argue, if the error is to big, you are NOT actually printing at the state size. So reducing error is what allows to print at these smaller size.
While that’s accurate, my primary interest revolves around whether it has any inherent properties that might enable it to enhance the final resolution beyond what the Lithography source can achieve.
Nvidia really gets the best talents